Free Access
Microsc. Microanal. Microstruct.
Volume 1, Number 3, June 1990
Page(s) 175 - 187
Microsc. Microanal. Microstruct. 1, 175-187 (1990)
DOI: 10.1051/mmm:0199000103017500

Structure and properties of rf magnetron sputtered W films

Marie-Christine Hugon1, Chantal Arena2, Bernard Agius1, Michel Froment3, Françoise Varniere1 et Colette Vignaud3

1  Institut Universitaire de Technologie de Paris Sud, Plateau du Moulon, BP 127, 91403 Orsay Cedex, France
2  LETI/IRDI CENG, 85X, 38041 Grenoble Cedex, France
3  Physique des Liquides et Electrochimie, UPR5, CNRS, Université Pierre et Marie Curie, Tour 22, 4 Place Jussieu, 75230 Paris Cedex 05, France

Without abstract

6855J - Structure and morphology; thickness; crystalline orientation and texture.

Key words
Thin films -- Cathode sputtering -- Characterization -- TEM -- RHEED -- SEM -- XRD -- Texture -- Electrical conductivity -- Tungsten -- Experimental study

© EDP Sciences 1990

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