Free Access
| Issue |
Microsc. Microanal. Microstruct.
Volume 1, Number 3, June 1990
|
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|---|---|---|
| Page(s) | 175 - 187 | |
| DOI | https://doi.org/10.1051/mmm:0199000103017500 | |
Microsc. Microanal. Microstruct. 1, 175-187 (1990)
DOI: 10.1051/mmm:0199000103017500
1 Institut Universitaire de Technologie de Paris Sud, Plateau du Moulon, BP 127, 91403 Orsay Cedex, France
2 LETI/IRDI CENG, 85X, 38041 Grenoble Cedex, France
3 Physique des Liquides et Electrochimie, UPR5, CNRS, Université Pierre et Marie Curie, Tour 22, 4 Place Jussieu, 75230 Paris Cedex 05, France
PACS
6855J - Structure and morphology; thickness; crystalline orientation and texture.
Key words
Thin films -- Cathode sputtering -- Characterization -- TEM -- RHEED -- SEM -- XRD -- Texture -- Electrical conductivity -- Tungsten -- Experimental study
© EDP Sciences 1990
DOI: 10.1051/mmm:0199000103017500
Structure and properties of rf magnetron sputtered W films
Marie-Christine Hugon1, Chantal Arena2, Bernard Agius1, Michel Froment3, Françoise Varniere1 et Colette Vignaud31 Institut Universitaire de Technologie de Paris Sud, Plateau du Moulon, BP 127, 91403 Orsay Cedex, France
2 LETI/IRDI CENG, 85X, 38041 Grenoble Cedex, France
3 Physique des Liquides et Electrochimie, UPR5, CNRS, Université Pierre et Marie Curie, Tour 22, 4 Place Jussieu, 75230 Paris Cedex 05, France
Without abstract
PACS
6855J - Structure and morphology; thickness; crystalline orientation and texture.
Key words
Thin films -- Cathode sputtering -- Characterization -- TEM -- RHEED -- SEM -- XRD -- Texture -- Electrical conductivity -- Tungsten -- Experimental study
© EDP Sciences 1990
First page of the article
