Microsc. Microanal. Microstruct. 6, 685-692 (1995)
DOI: 10.1051/mmm:1995158

Microstructural Characterization of Thin Films Obtained by Laser Irradiation

Paolo Mengucci¹, Gianni Barucca¹, Renato Marzocchini¹ et Gilberto Leggieri<sup>2

1</sup>  Dipartimento di Scienze dei Materiali e della Terra, Università di Ancona, Via Brecce Bianche, 60131 Ancona, Italy
²  Dipartimento di Fisica, Università di Lecce, Via Arnesano, 73100 Lecce, Italy

Abstract
Thin films obtained by direct pulsed excimer laser irradiation and by laser reactive ablation were characterized by scanning electron microscopy, cross sectional transmission electron microscopy and grazing angle X-ray diffraction. The results obtained were interpreted in function of the deposition parameters such as substrate temperature, pressure of the ambient atmosphere, number of laser pulses and laser fluence.

PACS
6855 - Thin film growth, structure, and epitaxy.
6480G - Microstructure.
8115I - Pulsed laser deposition.

Key words
crystal microstructure -- pulsed laser deposition -- scanning electron microscopy -- thin films -- transmission electron microscopy -- X ray diffraction -- microstructural characterization -- thin films -- laser irradiation -- direct pulsed excimer laser irradiation -- laser reactive ablation -- scanning electron microscopy -- cross sectional transmission electron microscopy -- grazing angle X ray diffraction -- deposition parameters -- substrate temperature -- ambient atmosphere -- laser pulses -- laser fluence -- SEM -- TEM -- XRD


© EDP Sciences 1995