Free Access
| Issue |
Microsc. Microanal. Microstruct.
Volume 8, Number 4-5, August / October 1997
|
|
|---|---|---|
| Page(s) | 287 - 300 | |
| DOI | https://doi.org/10.1051/mmm:1997122 | |
Microsc. Microanal. Microstruct. 8, 287-300 (1997)
DOI: 10.1051/mmm:1997122
1 Laboratoire de Chimie Physique-Matière et Rayonnement de l'Université Pierre et Marie Curie, URA 176, 11 rue Pierre et Marie, 75231 Paris Cedex 05, France
2 Centre de Recherches et d'Études d'Arcueil, 16 bis rue du Prieur de la Côte d'Or, 94114 Arcueil Cedex, France
3 Laboratoire Pierre Süe (CEA-CNRS), CEA/Saclay, 91191 Gif-sur-Yvette Cedex, France
6865 - Low dimensional structures: growth, structure and nonelectronic properties.
7920N - Atom , molecule , and ion surface impact and interactions.
7870E - X ray emission threshold and fluorescence condensed matter.
8280 - Chemical analysis and related physical methods of analysis.
Key words
aluminium -- buried layers -- electron probe analysis -- manganese -- metallic superlattices -- Rutherford backscattering -- semiconductor metal boundaries -- silicon -- X ray emission spectra -- depth profiles -- Al Mn Si multilayers -- electron scattering model -- IntriX -- electron X ray emission spectrometry -- high resolution -- stratified samples -- X ray intensity -- surface layer -- buried layer -- film substrate systems -- characterization -- nondestructive techniques -- electron probe microanalysis -- EPMA -- Rutherford backscattering -- RBS -- thicknesses -- Al Mn Si
© EDP Sciences 1997
DOI: 10.1051/mmm:1997122
Depth Profiles of Al/Mn/Si Multilayers
Chrystel Hombourger1, Philippe Jonnard1, Christiane Bonnelle1, Eric Beauprez2, Marc Spirckel2, Béatrice Feltz2, Dominique Boutard3 et Jean-Paul Gallien31 Laboratoire de Chimie Physique-Matière et Rayonnement de l'Université Pierre et Marie Curie, URA 176, 11 rue Pierre et Marie, 75231 Paris Cedex 05, France
2 Centre de Recherches et d'Études d'Arcueil, 16 bis rue du Prieur de la Côte d'Or, 94114 Arcueil Cedex, France
3 Laboratoire Pierre Süe (CEA-CNRS), CEA/Saclay, 91191 Gif-sur-Yvette Cedex, France
Abstract
An electron scattering model called IntriX associated to electron X-ray emission spectrometry (EXES) at high resolution is tested to characterize stratified samples. The ability of the model to
simulate the X-ray intensity emitted by a surface layer and a buried layer in film/substrate systems is illustrated. The characterization of Al/Mn/Si multilayers by means of non destructive
techniques (electron probe microanalysis (EPMA), Rutherford back scattering (RBS)) have been performed comparatively to the EXES measurements. The potentialities of the IntriX model
combined to EXES to predict thicknesses is established by comparison with EPMA and RBS results.
6865 - Low dimensional structures: growth, structure and nonelectronic properties.
7920N - Atom , molecule , and ion surface impact and interactions.
7870E - X ray emission threshold and fluorescence condensed matter.
8280 - Chemical analysis and related physical methods of analysis.
Key words
aluminium -- buried layers -- electron probe analysis -- manganese -- metallic superlattices -- Rutherford backscattering -- semiconductor metal boundaries -- silicon -- X ray emission spectra -- depth profiles -- Al Mn Si multilayers -- electron scattering model -- IntriX -- electron X ray emission spectrometry -- high resolution -- stratified samples -- X ray intensity -- surface layer -- buried layer -- film substrate systems -- characterization -- nondestructive techniques -- electron probe microanalysis -- EPMA -- Rutherford backscattering -- RBS -- thicknesses -- Al Mn Si
© EDP Sciences 1997