Free Access
| Issue |
Microsc. Microanal. Microstruct.
Volume 5, Number 4-6, August / October / December 1994
|
|
|---|---|---|
| Page(s) | 257 - 267 | |
| DOI | https://doi.org/10.1051/mmm:0199400504-6025700 | |
References of Microsc. Microanal. Microstruct. 5 257-267
- Siegenthaler H., in "Scanning Tunneling Microscopy II", R. Wiesendanger and H.-J. Güntherodt Eds., Springer Series Surf. Sci. 28 (1992).
- Allongue P., in "Advances in Electrochemical Science and Engineering", H. Gerischer and C. W. Tobias Eds., Vol. 4, Weinheim, in press.
- Morrison S.R., in "Electrochemistry at Semiconductor and Oxidized Metal Electrodes" (Plenum Press, New York, 1980).
- Allongue P., Kieling V. and Gerischer H., J. Electrochem. Soc. 140 (1993) 1009. [CrossRef]
- Allongue P., Brune H. and Gerischer H., Surf. Sci. 275 (1992) 414. [CrossRef]
- Kendall D.L., Ann. Rev. Mater Sci. 9 (1979) 373 [CrossRef]andSeidel H., Csepregi L., Heuberger A. and Baumgärtel H., J. Electrochem. Soc. 137 (1990) 3612 and 3626. [CrossRef]
- Allongue P., Kieling V. and Gerischer H., J. Electrochem. Soc. 140 (1993) 1018. [CrossRef]
- Gerischer H., Allongue P. and Costa-Kieling V., Ber. Bunsenges. Phys. Chem. 97 (1993) 753.
- Allongue P., Kieling V. and Gerischer H., Electrochim. Acta, in press.
- For a review, see Higashi G.S. and Chabal Y.J., in "Handbook of Semiconductor Wafer Cleaning Technology", W. Kern Ed. (Noyes Publications, Park Ridge, 1993).
- Venkateswara Rao A., Ozanam F. and Chazalviel J.-N., J. Electrochem. Soc. 138 (1991) 153. [CrossRef]
- Rappich J., Lewerenz H.J. and Gerischer H., J. Electrochem. Soc. 141 (1994) L187. [CrossRef]
- Allongue P., to be published.