Free Access
| Issue |
Microsc. Microanal. Microstruct.
Volume 6, Number 4, August 1995
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|---|---|---|
| Page(s) | 421 - 432 | |
| DOI | https://doi.org/10.1051/mmm:1995132 | |
References of Microsc. Microanal. Microstruct. 6 421-432
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- Brown. J.D., Analysis of thin films by electron Probe microanalysis, in Microbeam Analysis, D.E. Newbury Ed. (San Francisco Press, San Francisco, 1988) pp. 271-272.
- Ammann N., Lubig A. and Karduck P., Quantitative Analysis of (Y2O3)X(ZrO 2)1-X Films on Silicon by EPMA, Mikrochim. Acta [Suppl.]12 (1992) 213-219.
- Pouchou J.L. and Pichoir F., A new model for quantitative X-ray microanalysis, Part II: Application to in depth analysis of heterogeneous samples, La recherche aérospatiale, no 5 (1984) 47.
- Hunger H.J., Baumann W. and Schulze S., A New Method for Determining the Thickness and Composition of Thin Layers by Electron Probe Microanalysis, Cryst. Res. Technol. 20 (1985) 1427-1433. [CrossRef]
- Waldo R.A., An iteration procedure to calculate film compositions and thicknesses in electron-probe microanalysis, in Microbeam Analysis, D.E. Newbury Ed. (San Francisco Press, San Francisco, 1988) pp. 310-314.
- Bastin G.F., Heijligers H.J.M. and Dijkstra J.M., Computer programs for the calculation of X-ray intensities emitted by elements in multilayer structures, in Microbeam Analysis, J.R. Michael and P. Ingram Eds. (San Francisco Press, San Francisco, 1990) pp. 159-160.
- Pouchou J.L. and Pichoir F., Quantitative analysis of homogeneous and stratified microvolumes applying the model PAP, in Electron Probe Quantitation, K.F.J. Heinrich and D.E. Newbury Eds. (Plenum Press, New York, 1991) pp. 31-75.
- Ammann N., Gleitsmann G., Heuken M., Heime K. and Karduck P., Investigation of Implanted Gallium Depth Distributions in ZnSXSe 1-X by EPMA, Mikrochim. Acta 114/115 (1994) 165-173.
- Bastin G.F., Dijkstra J.M., Heijliger H.J.M. and Klepper D., Quantitative Electron Probe Microanalysis of Multi-layer Structures, Mikrochim. Acta [Suppl.]12 (1992) 93-97.
- Ammann N. and Karduck P., Quantitative depth profile Analysis by EPMA combined with Monte-Carlo simulation, Surf. and Interface Anal. 22 (1994) 54 -59. [CrossRef]
- D. Briggs and M.P. Seah Eds., Practical surface analysis, 2nd ed. (John Wiley Sons, Chichester, 1990).
- von Richthofen A., Matsuo M., Karduck P. and Ammann N., Combined EPMA and AES depth profiling of a multilayer Ti-Al-O-N coating, Mikrochim. Acta 114/115 (1994) 511-523.
- Karduck P. and von Richthofen A., EPMA sputter depth profiling: a new technique for quantitative in-depth analysis of layered structures, in Proceedings of the 29th Annual Conference of the Microbeam Analysis Society, E.S. Etz Ed. (VCH Publishers, 1995) pp. 205-206.
- Ammann N., Quantitative Tiefenprofilanalyse mit der Elektronenstrahlmikrosonde - Entwicklung der Technik und Untersuchungen zur Diffusion von Gallium in ZnSe/GaAs, Fortschr.-Ber. VDI Reihe 8, Nr. 399 (VDI-Verlag, Düsseldorf, 1994).
- Ammann N. and Karduck P., A further developed Monte Carlo model for the quantitative EPMA of complex samples, in Microbeam Analysis, J.R. Michael and P. Ingram Eds. (San Francisco Press, San Francisco, 1990) pp. 150-154.